[18a-E9-1~2] Plasma Electronics Invited Speech

[18a-E9-2] [INVITED]Modeling of Surface Reaction Kinetics in Plasma Etching Processes for Silicon, Metal, and High Dielectric Constant (High-k) Materials

^○Kouichi Ono¹ (Kyoto Univ.¹)

Keywords:プラズマ微細加工,表面反応過程,モデリング