[18a-F12-1~13] 3.7 Nano-optics

[18a-F12-13] Evaluation of polarization dependence of dressed photon etching

^○Takashi Yatsui^1,2, Itsuki Banno³, Katsuyuki Nobusada⁴, Fabrice Stehlin⁵, Olivier Soppera⁵, Tadashi Kawazoe¹, Motoichi Ohtsu¹ (Univ. Tokyo¹, JST/ALCA², Univ. Yamanashi³, IMS⁴, IS2M/ CNRS UMR⁵)

Keywords:ドレスト光子,エッチング,偏光