[18p-F2-1~13] 7.3 Lithography

[18p-F2-1] [INVITED]Development of EUV evaluation tools for EUV mask in NewSUBARU

^○Tetsuo Harada^1,2, Takeo Watanabe^1,2, Hiroo Kinoshita^1,2 (Univ. of Hyogo¹, CREST/JST²)

Keywords:EUVリソグラフィー,EUVマスク,コヒーレント回折イメージング