The 61st JSAP Spring Meeting, 2014

Presentation information

Oral presentation

07. Beam Technology and Nanofabrication » 7.4 Nanoimprint

[18p-F3-1~19] 7.4 Nanoimprint

Tue. Mar 18, 2014 2:00 PM - 7:00 PM F3 (F301)

2:00 PM - 2:15 PM

[18p-F3-1] 0.3 nm-high atomic-step patterning onto large PMMA surface by thermal nanoimprint

Geng Tan1, Naoya Inoue1, Tomoyuki Funabasama1, Masahiro Mita2, Norimichi Okuda3, Junichi Mori4, Koji Koyama5, Masaru Nakagawa6, Akifumi Matsuda1, Mamoru Yoshimoto1 (Tokyo Inst. Tech1, Kyodo Int'l Inc.2, SCIVAX Inc.3, Front-L Tech. Inc.4, Namiki Inc.5, Tohoku Univ.6)

Keywords:熱ナノインプリント,PMMA