[18p-F3-1~19] 7.4 Nanoimprint

△ [18p-F3-15] Simulation Study on Resist Shrinkage and De-molding Process in NIL

^○（B）Takamitsu Tochino¹, Takahiro Shiotsu¹, Kimiaki Uemura¹, Masaaki Yasuda¹, Hiroiaki Kawata¹, Yoshihiko Hirai¹ (Osaka Pref. Univ.¹, Osaka Pref. Univ.², Osaka Pref. Univ.³, Osaka Pref. Univ.⁴, Osaka Pref. Univ.⁵, Osaka Pref. Univ.⁶)

Keywords:ナノインプリント,離型,シミュレーション