The 61st JSAP Spring Meeting, 2014

Presentation information

Oral presentation

07. Beam Technology and Nanofabrication » 7.4 Nanoimprint

[18p-F3-1~19] 7.4 Nanoimprint

Tue. Mar 18, 2014 2:00 PM - 7:00 PM F3 (F301)

6:15 PM - 6:30 PM

[18p-F3-17] Simulation study on template releasing process in nanoimprint lithography(dependence on pattern structure)

Takahiro Shiotsu1, Kimiaki Uemura1, ○(B)Takmaitsu Tochino1, Masaaki Yasuda1, Hiroaki Kawata1, Yoshihiko Hirai1 (Osaka Pref. Univ.1, Osaka Pref. Univ.2, Osaka Pref. Univ.3, Osaka Pref. Univ.4, Osaka Pref. Univ.5, Osaka Pref. Univ.6)

Keywords:ナノインプリント,離型,シミュレーション