[18p-PA7-1~2] 8.4 Plasma etching

[18p-PA7-2] Analysis on etching rate of silicon surface by hydrogen plasma based on first-principles calculations

^○Kouji Inagaki^1,2, Yoshitada Morikawa¹, Kiyoshi Yasutake^1,2 (Osaka Univ.¹, CREST-JST²)

Keywords:Si表面,Hプラズマ,エッチングレート