[18p-PA8-1~14] 8.6 General plasma phenomena, emerging area of plasmas and their new applications

[18p-PA8-1] Formation of Polycrystalline Si Film Using Selective Heating Phenomenon of Transition Metal by Hydrogen Radical Irradiation and Its Application to Device Fabrication

^○Hiroki Nakaie¹, Kazuki Kamimura¹, Tetsuji Arai¹, Keisuke Arimoto¹, Junji Yamanaka¹, Tetsuya Sato¹, Kiyokazu Nakagawa¹, Toshiyuki Takamatsu², Kentarou Sawano³ (Univ. of Yamanashi¹, SST Inc.², Tokyo City Univ.³)

Keywords:水素ラジカル,多結晶Si,選択加熱