[19a-PA3-1~2] 8.1 Plasma production and control

[19a-PA3-2] Evaluation of Degree of Dissociation in Microwave Hydrogen Plasma with Narrow Gap under High Pressure Condition

^○Takahiro Yamada^1,3, Takahiro Adachi², Kosuke Yamada¹, Hiromasa Ohmi^1,3, Hiroaki Kakiuchi^1,3, Kiyoshi Yasutake^1,3 (Osaka Univ.¹, Osaka Univ.², JST CREST³)

Keywords:Silicon,Silane,Etching