[19a-PA4-1~12] 8.3 Plasma deposition of thin film and surface treatment

[19a-PA4-1] Characterization of Fluorinated Amorphous Carbon Films Fabricated by Low-energy Electron Beam Irradiation on Solid Thin Films Formed from PFC Gas condensed at Cryogenic Temperature

^○Kenji Wakou¹, Haruka Soga¹, Kyouhei Morikawa¹, Tetuya Sato¹, Kiyokazu Nakagawa¹ (Univ. of Yamanashi¹)

Keywords:C4F8,アモルファスカーボン,低温