9:30 AM - 11:30 AM
[19a-PA4-3] Characterization of a-Si:H:F Thin Films Fabricated by Low-energy Electron Beam Irradiation on Solid Thin Films of Silicon Tetrafluoride Formed at Cryogenic Temperature.
Keywords:a-Si,四フッ化ケイ素,極低温
Poster presentation
08. Plasma Electronics » 8.3 Plasma deposition of thin film and surface treatment
Wed. Mar 19, 2014 9:30 AM - 11:30 AM PA4 (アリーナ)
9:30 AM - 11:30 AM
Keywords:a-Si,四フッ化ケイ素,極低温