High Density Formation of Fe-Silicide Nanodots on SiO2 Induced by Remote H2 Plasma

Presentation information

Oral presentation

14. Semiconductors B (Exploratory Materials, Physical Properties, Devices) » 14.1 Physical properties of exploratory materials

Wed. Mar 19, 2014 2:00 PM - 5:45 PM D3 (D114)

5:00 PM - 5:15 PM

^○Hai Zhang¹, Katsunori Makihara¹, Akio Ohta², Mitsuhisa Ikeda³, Seiichi Miyazaki¹ (Nagoya Univ¹, Nagoya Univ. VBL², Hiroshima Univ.³)

Keywords:シリサイドナノドット,鉄シリサイドナノドット,水素プラズマ