Effect of O<sub>2</sub> introduction Al doped CeO<sub>2</sub> thin films deposited by sputtering method (1)

Kenta Hara

Presentation information

Oral presentation

06. Thin Films and Surfaces » 6.4 New thin-film materials

[19p-D6-1~18] 6.4 New thin-film materials

Wed. Mar 19, 2014 1:45 PM - 6:30 PM D6 (D209)

5:45 PM - 6:00 PM

[19p-D6-16] Effect of O₂ introduction Al doped CeO₂ thin films deposited by sputtering method (1)

^○Kenta Hara¹, Takuya Okazaki¹, Yuki Notani¹, Takashi Osawa¹, Keisuke Hibino¹, Setsu Suzuki², Keiji Ishibashi², Yasuhiro Yamamoto¹ (Hosei Univ.¹, Comet Inc.²)

Keywords:半導体,スパッタリング

« Previous in this session
Next in this session »

▲

Presentation information

[19p-D6-1~18] 6.4 New thin-film materials

[19p-D6-16] Effect of O2 introduction Al doped CeO2 thin films deposited by sputtering method (1)

[19p-D6-16] Effect of O₂ introduction Al doped CeO₂ thin films deposited by sputtering method (1)