[19p-E14-1~21] 13.3 Si Process・Interconnect・MEMS・Integration

[19p-E14-6] The Wafer Cleaning Process in the minimal

^○Shuuji Okuda¹, Sonoko Matsuda², Akihiro Goto², Sommawan Khumpuang^1,3, Shiro Hara^1,3 (MINIMAL¹, PRETECH², AIST³)

Keywords:minimal,洗浄