[19p-E14-1~21] 13.3 Si Process・Interconnect・MEMS・Integration

[19p-E14-7] Cleaning process for contaminated wafer using MINIMAL Piranha Solution

^○Sonoko Matsuda^1,2, Akihiro Goto^1,2, Shuuji Okuda², Sommawan Khumpuang^2,3, Shiro Hara^2,3 (PRE-TECH CO.,LTD¹, MINIMAL², AIST³)

Keywords:minimal fab,洗浄,硫酸過水