The 61st JSAP Spring Meeting, 2014

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Oral presentation

06. Thin Films and Surfaces » 6.3 Oxide-based electronics

[19p-E8-1~21] 6.3 Oxide-based electronics

Wed. Mar 19, 2014 1:15 PM - 6:45 PM E8 (E202)

5:00 PM - 5:15 PM

[19p-E8-15] Development of 300mm Mass Production Sputtering Technology for ReRAM

○Natsuki Fukuda1, Kazunori Fukuju1, Yutaka Nishioka1, Koukou Suu1 (ULVAC ISET1)

Keywords:ReRAM,抵抗変化メモリ,Sputtering