Doping technique of stacked epitaxial Si nanodots and its thermoelectric properties

Presentation information

Oral presentation

09. Applied Materials Science » 9.4 Thermoelectric conversion

Wed. Mar 19, 2014 1:15 PM - 6:15 PM F11 (F407)

3:15 PM - 3:30 PM

^○Tomohiro Ueda¹, Yoshiaki Nakamura^1,2, Shotaro Takeuchi¹, Akira Sakai¹ (Osaka Univ.¹, PRESTO-JST²)

Keywords:Si,ドーピング,ナノドット