[19p-F6-1~18] 8.4 Plasma etching

[19p-F6-14] Neutral Beam Etching Process Using Bio-template for Fabrication of Ge Nanodisk

^○Erman Mohd^1,5, Takeru Okada¹, Taiga Isoda^3,5, Kohei Ito^3,5, Ichiro Yamashita^4,5, Seiji Samukawa^1,2,5 (IFS, Tohoku Univ.¹, WPI-AIMR, Tohoku Univ.², Keio Univ.³, NAIST⁴, JST-CREST⁵)

Keywords:neutral beam,ゲルマニウム