[19p-PA2-1~9] 1.3 Novel Technologies and Frontier Engineering Science

[19p-PA2-9] Cl₂ Plasma Resistance of Positive Type Electron Beam Resist gL2000 for Compound Semiconductor Etching Processes

^○Akihiro Matsutani¹, Masahiko Watanabe², Yukiko Omata² (Tokyo Tech¹, Elionix²)

Keywords:レジスト,プラズマ,エッチング