Comparative study on reliability of ultrathin amorphous and polycrystalline HfO2 films

Presentation information

Poster presentation

13. Semiconductors A (Silicon) » 13.2 Insulator technology

Wed. Mar 19, 2014 4:00 PM - 6:00 PM PG2 (G棟2階)

4:00 PM - 6:00 PM

^○Yusuke Tomura¹, Ryu Hasunuma¹, Kikuo Yamabe¹, Shinji Migita² (Tsukuba Univ.¹, AIST NRI.²)

Keywords:HfO2,TDDB,high-k