[19p-PG4-1~5] 13.5 Si-English Session

▲ [19p-PG4-3] Surface Cleaning of (100) n-Ge by H₂O₂ Aqueous Solution

^○Wenfeng Zhang^1,2, Cimang Lu^1,2, ChoongHyun Lee^1,2, Tomonori Nishimura^1,2, Kosuke Nagashio^1,2, Akira Toriumi^1,2 (Tokyo Univ.¹, JST-CREST²)

Keywords:wafer cleaning,germanium,surface roughness