[19p-PG4-1~5] 13.5 Si-English Session

▲ [19p-PG4-3] Surface Cleaning of (100) n-Ge by H₂O₂ Aqueous Solution

^○WenfengZhang^1,2，CimangLu^1,2，ChoonghyunLee^1,2，TomonoriNishimura^1,2，KosukeNagashio^1,2，AkiraToriumi^1,2 (東大院工¹，JST-CREST²)

キーワード：wafer cleaning,germanium,surface roughness