The 61st JSAP Spring Meeting, 2014

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Oral presentation

13. Semiconductors A (Silicon) » 13.5 Si-English Session

[20a-F10-1~13] 13.5 Si-English Session

Thu. Mar 20, 2014 9:00 AM - 12:30 PM F10 (F406)

11:15 AM - 11:30 AM

▼ [20a-F10-9] Self-accelerating oxidation at oxide/Si(111) interfaces studied by real-time photoelectron spectroscopy

○（D）Jiayi Tang1, Kiwamu Nishimoto1, Shuichi Ogawa1, Akitaka Yoshigoe2, Shinnji Ishidzuka3, Daiki Watanabe1, Yuden Teraoka2, Yuji Takakuwa1 (Tohoku Univ.1, JAEA2, Nagaoka Univ. Tech.3)

Keywords:界面酸化,リアルタイム光電子分光法,シリコン酸化