Deposition of Intermediate Oxide Films by Pulsed-DC Reactive Sputtering

Presentation information

Poster presentation

06. Thin Films and Surfaces » 6.4 New thin-film materials

Thu. Mar 20, 2014 9:30 AM - 11:30 AM PA1 (アリーナ)

9:30 AM - 11:30 AM

^○Koichi Muro¹, Kiyoshi Ishii¹, Hiroshi Sakuma¹, Shunji Tanaka², Hiromi Tanaka² (Utsunomya Univ.¹, TANAKA ENGINEERING INC.²)

Keywords:DCパルススパッタ,反応性スパッタ,中間酸化膜