The 76th JSAP Autumn Meeting, 2015

Presentation information

Symposium

Symposium » Progress of semiconductor wet processing - from silicon to compound -

[13p-1B-1~10] Progress of semiconductor wet processing - from silicon to compound -

Sun. Sep 13, 2015 1:15 PM - 5:45 PM 1B (133+134)

座長:真田 俊之(静岡大)

3:45 PM - 4:15 PM

[13p-1B-5] Carbon Plating by Molten Salt Electrochemical Process

〇Hiroyuki Tsujimura1, Tokujiro Nishikiori1, Yasuhiko Ito1 (1.I'MSEP Co., Ltd.)

Keywords:carbon,electroplating,molten salt

Electrochemical carbon plating processes have been studied. A dense and adherent carbon film coating can be achieved by the anodic oxidation of C22− ions dissolved in a molten salt. The obtained carbon-coated metal shows advantageous features for materials of energy devices such as a current collector for high-capacity electrochemical capacitor, Li-ion secondary battery, and so on.