〇Masayuki Kawakami¹, Yano Daisaku¹, Yamanaka Koji¹, Araki Hiroyuki², Miya Katsuhiko³, Suzuki Masanori⁴, Kawase Nobuo⁵ (1.Organo Corp., 2.SCREEN Semiconductor Solutions Co., 3.SCREEN Holdings Co., 4.Techno Ryowa Ltd., 5.JoyNTech)

4:45 PM - 5:00 PM

△ [13p-1B-7] Molecular Dynamics Analysis on the Adsorption Behavior of Water and Alcohol near SiO₂ Surface

〇Satoshi Nakaoka¹, Yasutaka Yamaguchi¹, Masayuki Kawakami², Daisaku Yano², Koji Yamanaka² (1.Osaka Univ., 2.Organo Corp.)

5:00 PM - 5:15 PM

[13p-1B-8] Challenge of Japan Sonic device miniaturization cleaning

〇Yoshiharu Yamamoto¹ (1.Yamato Technos)

5:15 PM - 5:30 PM

[13p-1B-9] Analysis method of metal contamination for IPA

〇Yudai Ito¹, kazuya Dobashi¹, Misako Saito¹ (1.Tokyuo Electron Limited)

5:30 PM - 5:45 PM

[13p-1B-10] Closing remarks: Progress of semiconductor wet processing - from silicon to compound -

〇Yuki Yoshida¹ (1.KANTO CHEMICAL)

Sessions

Symposium » Progress of semiconductor wet processing - from silicon to compound -

[13p-1B-1~10] Progress of semiconductor wet processing - from silicon to compound -

[13p-1B-1] Opening; Positioning of INE activity

[13p-1B-2] The person who controls power controls the future. - Si, SiC and GaN -

[13p-1B-3] Human sense, Science & Simulation for Linking Nano-Interface & Macro Behavior

[13p-1B-4] Study of cleaning technology for SiC substrate

[13p-1B-5] Carbon Plating by Molten Salt Electrochemical Process

△ [13p-1B-6] Study of charge up after single wafer wet processing

△ [13p-1B-7] Molecular Dynamics Analysis on the Adsorption Behavior of Water and Alcohol near SiO₂ Surface

[13p-1B-8] Challenge of Japan Sonic device miniaturization cleaning

[13p-1B-9] Analysis method of metal contamination for IPA

[13p-1B-10] Closing remarks: Progress of semiconductor wet processing - from silicon to compound -

Authentication

Sessions

Symposium » Progress of semiconductor wet processing - from silicon to compound -

[13p-1B-1~10] Progress of semiconductor wet processing - from silicon to compound -

△ [13p-1B-6] Study of charge up after single wafer wet processing

△ [13p-1B-7] Molecular Dynamics Analysis on the Adsorption Behavior of Water and Alcohol near SiO2 Surface

Authentication

△ [13p-1B-7] Molecular Dynamics Analysis on the Adsorption Behavior of Water and Alcohol near SiO₂ Surface