[13p-1C-1~15] 13.4 Si wafer processing /MEMS/Integration technology

[13p-1C-1] An in-line MINIMAL FAB process from producing photomasks to transistor fabrication

〇Norio Umeyama^1,2, Yuji Kitayama², Haruki Toonoe², Junko Kazusa², Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.AIST, 2.MINIMAL)

Keywords:MINIMAL FAB,photomask

Photomask produce is usually made in clean rooms, is in yellow room with controls of particles. For minimal fab, a person can make a photomask by self under the environment without the clean room using minimal machines for wafer process. We produced photomasks using a mask less exposure machine, and we were made a transistor after aligner exposure by stacking with the mask and wafer. The in-line process is finished in several days, and is widely applied.