The 76th JSAP Autumn Meeting, 2015

Presentation information

Oral presentation

15 Crystal Engineering » 15.4 III-V-group nitride crystals

[13p-1D-1~26] 15.4 III-V-group nitride crystals

Sun. Sep 13, 2015 1:15 PM - 8:15 PM 1D (141+142)

座長:斉藤 真(三菱化学),岡田 成仁(山口大),岩谷 素顕(名城大)

6:30 PM - 6:45 PM

[13p-1D-20] Influence of constituents in ScAlMgO4 substrates on properties of GaN epitaxial layers

〇(D)Takuya Ozaki1, Mitsuru Funato1, Yoichi Kawakami1 (1.Kyoto Univ.)

Keywords:ScAlMgO4,GaN

ScAlMgO4(SCAM) is an attractive substrate material for the growth of nitride semiconductors because it has smaller lattice and thermal expansion mismatch with GaN than sapphire. In order to further improve the performance of devices on SCAM substrates, we investigate the influence of constituents in SCAM substrates on properties of GaN epitaxial layers. Assessing optical properties of undoped and Mg-doped GaN, we revealed that Mg element in SCAM substrates contributes to higher Mg concentration in GaN on SCAM than that on saphire.