The 76th JSAP Autumn Meeting, 2015

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Oral presentation

6 Thin Films and Surfaces » 6.3 Oxide electronics

[13p-2H-1~21] 6.3 Oxide electronics

Sun. Sep 13, 2015 1:45 PM - 7:15 PM 2H (222)

座長:矢嶋 赳彬(東大),藤原 宏平(東北大)

5:15 PM - 5:30 PM

△ [13p-2H-14] Ion-gate Induced Phase Changes and Their Spatial Distribution in WO3 Thin films

〇SHINICHI NISHIHAYA1, MASAKI UCHIDA1, YUSUKE KOZUKA1, YOSHIHIRO IWASA1,2, MASASHI KAWASAKI1,2 (1.the Univ. of Tokyo, 2.CEMS, RIKEN)

Keywords:Tungsten oxide,EDLT,Intercalation