Influence of laser fluence on surface oxidation of Si substrate for PLD growth of HfO<sub>2</sub> layer

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.4 Thin films and New materials

Sun. Sep 13, 2015 1:15 PM - 8:30 PM 2Q (231-1)

座長:西川博昭(近畿大),田中勝久(京大),名村今日子(京大),篠田健太郎(産総研)

4:30 PM - 4:45 PM

〇(M1)Satoshi Ueoka¹, Shozo Miyake¹, Haruhiko Yoshida¹, Koji Arafune¹, Shin-ichi Satoh¹, Yasushi Hotta¹ (1.Univ. of Hyogo)

Keywords:high-k,SiO2,HfO2