The 76th JSAP Autumn Meeting, 2015

Presentation information

Poster presentation

15 Crystal Engineering » 15.3 III-V-group epitaxial crystals

[13p-PB2-1~15] 15.3 III-V-group epitaxial crystals

Sun. Sep 13, 2015 1:30 PM - 3:30 PM PB2 (Shirotori Hall)

1:30 PM - 3:30 PM

[13p-PB2-7] Influence of Si Doping on Electrical Properties in GaAsN Thin Films Grown by anAtomic Layer Epitaxy

〇yuki yokoyama1, Masaru Horikiri1, Hideaki Hashimoto1, Tomohiro Haraguchi1, Toshihiro Yamauchi1, Hidetoshi Suzuki1, Koji Maeda1, Tetsuo Ikari1, Atsuhiko Fukuyama1 (1.Univ. of Miyazaki)

Keywords:Atomic Layer Epitaxy,III-V-N semiconductor,Si doping