The 76th JSAP Autumn Meeting, 2015

Presentation information

Poster presentation

15 Crystal Engineering » 15.7 Fundamentals of epitaxy

[13p-PB3-1~2] 15.7 Fundamentals of epitaxy

Sun. Sep 13, 2015 1:30 PM - 3:30 PM PB3 (Shirotori Hall)

1:30 PM - 3:30 PM

[13p-PB3-1] Effect of Si doping on vertical growth rate in GaAs microchannel epitaxy

〇Yosuke Mizuno1, Masafumi Tomita1, Daisuke Kambayashi1, Hiroyuki Takakura1, Muneki Iwakawa1, Yuko Shiraki1, Takahiro Maruyama1, Shigeya Naritsuka1 (1.Meijo Univ.)

Keywords:crystal growth,GaAs,microchannel epitaxy