[13p-PB6-1~20] 21.1 Joint Session K

[13p-PB6-4] Influence of NO addition on the properties of ZnO films grown on a-plane sapphire substrates using high-temperature H₂O generated by a catalytic reaction

Yuki Ishidzuka¹, Ryoichi Tajima¹, Yuki Ohashi¹, Yasuhiro Tamayama¹, 〇Kanji Yasui¹ (1.Nagaoka Univ. Technol.)

Keywords:zinc oxide,catalytic reaction,CVD

We have developed a new CVD method for ZnO film growth using a reaction between an alkylzinc (DMZn) and high-temperature H₂O generated by a catalytic reaction on Pt-nanoparticles. The resulting ZnO films grown on a-plane (11-20) sapphire (a-Al₂O₃) substrates exhibit excellent optical and electronic properties. In this study, we have investigated the influence of the NO gas addition during the film growth on the properties of the resultant ZnO films.