[14a-1C-1~10] 13.4 Si wafer processing /MEMS/Integration technology

[14a-1C-4] Q factor enhancement of a carbon nanomechanical resonator by fluorine surface modification

〇Reo Kometani¹, Takumi Miyakoshi¹, Etsuo Maeda¹ (1.The Univ. of Tokyo)

Keywords:nanomechanical resonator,Q factor,Surface modification

In this study, Q factor improvement of carbon mechanical resonator was tried by surface modification using XeF₂ gas. And also, the relationship between resonance, process condition of surface modification and surface condition of a carbon nanomechanical resonator was evaluated. As a result, increase in Q factor depended on the exposure time of XeF₂ gas. And, we found that the Q factor improvement ratio was approximately 1.7 after 60-sec fluorination.