The 76th JSAP Autumn Meeting, 2015

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Oral presentation

13 Semiconductors » 13.3 Insulator technology

[14a-4C-1~10] 13.3 Insulator technology

Mon. Sep 14, 2015 9:00 AM - 11:45 AM 4C (432)

座長:渡部 平司(阪大),井上 真雄(ルネサス)

10:45 AM - 11:00 AM

[14a-4C-7] Study of High-quality Crystalline La2O3/Ge(111) Interface by using XPS Analyses

〇Takeshi Kanashima1, Hiroshi Nohira2, Masato Zenitaka1, Taro Kobayashi1, Riku Yamashiro1, Shinya Yamada1, Kohei Hamaya1 (1.Osaka Univ., 2.Tokyo City Univ.)

Keywords:XPS,La2O3,epitaxial