The 76th JSAP Autumn Meeting, 2015

Presentation information

Symposium

Symposium » Evaluation technology for oxide semiconductor

[14p-1B-1~9] Evaluation technology for oxide semiconductor

Mon. Sep 14, 2015 1:15 PM - 6:00 PM 1B (133+134)

座長:反保 衆志(産総研),山本 哲也(高知工科大)

2:45 PM - 3:15 PM

[14p-1B-4] X-ray diffraction analysis of functional oxide thin films

〇Katsuhiko Inaba1 (1.Rigaku Corp.)

Keywords:X-ray diffraction,oxide,epitaxial thin films

In a modern XRD apparatus, various and complicated measurement techniques can be accomplished with the improvement of optics, or by equipping multidimensional X-ray detectors, and so on. Analytical examples of functional oxide thin films will be shown characterized by the combination of various techniques, including GI-XRD (Grazing-Incidence XRD), GI-InPlane-XRD, Pole Figure, RSM (Reciprocal Space Mapping), wide-range RSM, XRR (X-ray reflectivity) measurements, etc. The latest results such as the polarity determination, topography will also be reported.