Formation of Si:α-Fe<sub>2</sub>O<sub>3</sub> Thin Films by Two-step Pulsed Laser Deposition and Control of Their Elctrical and Magnetic Properties

Munetoshi Seki

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.3 Oxide electronics

[14p-2H-1~15] 6.3 Oxide electronics

Mon. Sep 14, 2015 1:45 PM - 5:45 PM 2H (222)

座長:吉松公平(東工大),打田正輝(東大)

2:30 PM - 2:45 PM

[14p-2H-4] Formation of Si:α-Fe₂O₃ Thin Films by Two-step Pulsed Laser Deposition and Control of Their Elctrical and Magnetic Properties

〇Munetoshi Seki¹, Takeshi Ishida¹, Hidekazu Nasu¹, Ameya Sathe¹, Tetsuya Murata¹, Shunsuke Kawabe¹, Hiroyasu Yamahara¹, Hitoshi Tabata¹ (1.Univ. of Tokyo)

Keywords:Iron oxide,Pulsed laser deposition

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Presentation information

[14p-2H-1~15] 6.3 Oxide electronics

[14p-2H-4] Formation of Si:α-Fe2O3 Thin Films by Two-step Pulsed Laser Deposition and Control of Their Elctrical and Magnetic Properties

[14p-2H-4] Formation of Si:α-Fe₂O₃ Thin Films by Two-step Pulsed Laser Deposition and Control of Their Elctrical and Magnetic Properties