[14p-PB11-1~6] 7.6 Ion beams

[14p-PB11-1] Evaluation of dopant ion distribution implanted through nanohole mask using 3D atom probe
- Enhancing the aiming precision of single-ion implantation-

〇(M1)Maasa YANO¹, Yuki CHIBA¹, Yasuo SHIMIZU², Koji INOUE², Yasuyoshi NAGAI², Takashi TANII¹, Takahiro SHINADA³ (1.Waseda Univ., 2.IMR Tohoku Univ., 3.CIES Tohoku Univ.)

Keywords:single-ion implantation,3D atom probe