The 76th JSAP Autumn Meeting, 2015

Presentation information

Oral presentation

13 Semiconductors » 13.5 Semiconductor devices and related technologies

[15a-1C-1~7] 13.5 Semiconductor devices and related technologies

Tue. Sep 15, 2015 10:00 AM - 11:45 AM 1C (135)

座長:小林 正治(東大)

11:00 AM - 11:15 AM

[15a-1C-5] Mesoscopic Blockade and Staircase Phenomena of Holes in DNA/Si-MOSFET
by Gate Voltage Modulation

〇Naoto Matsuo1, Shouhei Nakamura1, Tadao Takada1, Akira Heya1, Kazushige Yamana1, Tadashi Sato2, Shin Yokoyama2, Yasuhisa Omura3 (1.Univ Hyogo, 2.Hiroshima Univ, 3.Kansai Univ)

Keywords:Mesoscopic,DNA,Si

Mesoscopic blockade/staircase phenomena of holes in λ-DNA channel bridged between the Si source/drain electrodes, which were fabricated on the SiO2/Si substrate, were observed at 20 to 200K by applying the gate voltage. It is considered, first, that the DNA/allyl glycidyl ether(AGE), which connects the DNA to the both Si electrodes/Si is the wave function-penetrating-contact, and second, that the potential of the 1-nm-thick AGE dielectric is modulated by the gate voltage. A multi-valued logic circuit by the DNA is expected to perform at liquid nitrogen temperature.