[15a-2Q-1~12] 8.4 Plasma etching

[15a-2Q-2] Development of in-situ trench depth measuring system in power semiconductor

〇Kousuke Fukuchi¹, Shigeru Nakamoto¹, Satomi Inoue¹ (1.Hitachi High-Technologies)

Keywords:trench depth measurement,plasma emission,in-situ