The 76th JSAP Autumn Meeting, 2015

Presentation information

Print

Oral presentation

8 Plasma Electronics » 8.4 Plasma etching

[15a-2Q-1~12] 8.4 Plasma etching

Tue. Sep 15, 2015 9:00 AM - 12:15 PM 2Q (231-1)

座長:辰巳 哲也(ソニー),石川 健治(名大)

9:30 AM - 9:45 AM

[15a-2Q-3] High-rate Etching of Copper by High-Pressure Hydrogen Plasma

〇(M2)Jumpei Sato1, Tatsuya Hirano1, Yusuke Kubota2, Hiroaki Kakiuchi1, Kiyoshi Yasutake1, Hiromasa Ohmi1 (1.Osaka Univ., 2.TOKYO ELECTRON LTD.)

Keywords:copper,Hydrogen Plasma,High-Pressure