[15a-2Q-1~12] 8.4 Plasma etching

△ [15a-2Q-6] Dependence of Sidewall Surface Reaction on Wafer Temperature for Organic film

〇Yusuke Fukunaga¹, Takayoshi Tsutsumi¹, Keigo Takeda¹, Kenji Ishikawa¹, Hiroki Kondo¹, Makoto Sekine¹, Masaru Hori¹ (1.Nagoya Univ.)

Keywords:Etching,Substrate Temperature,Sidewall Reaction