[15a-2Q-1~12] 8.4 Plasma etching

[15a-2Q-7] [JSAP Young Scientist Award Speech] Molecular dynamics simulations of silicon chloride ion incidence during Si etching in Cl-based plasmas

〇Nobuya Nakazaki¹, Yoshinori Takao¹, Koji Eriguchi¹, Kouichi Ono¹ (1.Kyoto Univ.)

Keywords:Young Scientist Award

Molecular dynamics simulations of silicon chloride ion incidence during Si etching in Cl-based plasmas