[15a-2Q-1~12] 8.4 プラズマエッチング

[15a-2Q-7] [論文奨励賞受賞記念講演] Molecular dynamics simulations of silicon chloride ion incidence during Si etching in Cl-based plasmas

〇中崎 暢也¹、鷹尾 祥典¹、江利口 浩二¹、斧 高一¹ (1.京大)

キーワード：論文奨励賞

Molecular dynamics simulations of silicon chloride ion incidence during Si etching in Cl-based plasmas