[15a-4F-1~9] 6.2 Carbon-based thin films

[15a-4F-2] a-CNx:H/Al Multi-Layer Films for Field Emission Use by Supermagnetron Plasma CVD

〇Haruhisa Kinoshita¹, Sho Suzuki¹, Ryouhei Taguchi¹, Yoku Murayama¹ (1.Shizuoka Univ.)

Keywords:supermagnetron plasma

Using pulsed-RF supermagnetron plasma CVD, a-CNx:H films were deposited on Al Films, which were applied to field electron emission devices. These a-CNx:H films showed electro-conductive and were suited to plane-type field emitters. In this study, we deposited multi-layer stucture of a-CNx:H/Al/a-CNx:H on p-Si, and whose electron emission characteristics were investigated.