2015年 第76回応用物理学会秋季学術講演会

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13 半導体 » 13.4 Siプロセス・配線・MEMS・集積化技術

[15a-PB4-1~9] 13.4 Siプロセス・配線・MEMS・集積化技術

2015年9月15日(火) 09:30 〜 11:30 PB4 (白鳥ホール)

09:30 〜 11:30

[15a-PB4-8] Electrical Properties of Pulsed-Laser Crystallized Poly-Si Thin Films Grown on YSZ Crystallization-Induction Layers by Two-Step Irradiation Method

〇Lien Mai1, Susumu Horita1 (1.JAIST)

キーワード:poly-Si,pulsed laser,Hall effect

Conductivities of pulsed-laser-crystallized Si thin films with/without YSZ layers by the two-step method were investigated. The temperature dependences were also measured for both undoped and P-doped films using AC Hall effect measurement. It was found that the Si/YSZ/glass structure exhibited higher conductivities than those of the Si/glass. This suggested that the Si film crystallized on the YSZ layer is more suitable for application of electronic devices, compared with the Si film on glass.