[15p-1C-1~18] 13.5 Semiconductor devices and related technologies

[15p-1C-14] Improvement of crystallinity of sputtered-MoS₂ thin film by lowering pressure for sulfur-powder annealing

〇(M1)kentarou matsuura¹, Takumi Ohashi¹, Seiya Ishihara², Naomi Sawamoto², Yusuke Hibino², Suda Kohei², Kuniyuki Kakushima¹, Kazuo Tsutsui¹, Atsushi Ogura², Hitoshi Wakabayashi¹ (1.Tokyo Tech., 2.Meiji Univ.)

Keywords:molybdenum disulfide,sputtering method,sulfur-powder annealing