The 76th JSAP Autumn Meeting, 2015

Presentation information

Oral presentation

13 Semiconductors » 13.2 Exploratory Materials, Physical Properties, Devices

[15p-2R-1~22] 13.2 Exploratory Materials, Physical Properties, Devices

Tue. Sep 15, 2015 1:30 PM - 7:15 PM 2R (231-2)

座長:立岡 浩一(静岡大),鵜殿 治彦(茨城大)

2:15 PM - 2:30 PM

[15p-2R-4] Abnormal electrical property by applying dynamic strain in p-type Si wafer

〇Kazuki Tsuruta1, Masaki Mito1, Takayuki Tajiri2, Yuki Katamune3, Tsuyoshi Yoshitake3 (1.Kyushu Inst. of Tech., 2.Fukuoka Univ., 3.Kyushu Univ.)

Keywords:semiconductor,silicon,dynamic strain

Generally, the piezoresistance and strained silicon are known as control of physical properties using the strain in semiconductor. Amplitude of this strain does not change against time, we call static strain. We replaced the static strain with a dynamic strain which the amplitude of the strain changed at the ultrasonic frequency because we expected that the carrier mobility or the electrical resistance improved under the dynamic strain. We could observe the abnormal behavior in the electrical resistance measurement of p-type silicon wafer.