The 76th JSAP Autumn Meeting, 2015

Presentation information

Oral presentation

7 Beam Technology and Nanofabrication » 7.2 Applications and technologies of electron beams

[15p-4E-1~23] 7.2 Applications and technologies of electron beams

Tue. Sep 15, 2015 1:15 PM - 7:30 PM 4E (437)

座長:村田 英一(名城大),嶋脇 秀隆(八戸工大)

3:00 PM - 3:15 PM

[15p-4E-8] Development of electrostatic Cs-corrector with annular and circular electrodes (experiments)

〇Yuki Ogawa1, Yasuyuki Takai1, Tadahiro Kawasaki2,3, Takafumi Ishida3, Tetsuji Kodama1, Takashi Ikuta4 (1.Meijo Univ, 2.JFCC, 3.EcoTopia Sci Inst, Nagoya Univ, 4.Osaka Electro-Communication Univ)

Keywords:spherical-aberration-corrector,electrostatic lens,STEM

The spherical-aberration-corrector for high-resolution electron microscopes has been originally developed. This aberration correction device is formed by an electrostatic lens consisted of only two electrodes having annular and circular holes and a constant-voltage supply. The annular electrodes were fabricated by using the focused ion beam (FIB) technique. The annular and circular electrodes were assembled on tip of the conventional aperture holder and installed in Hitachi STEM; HD-2300S (acc. voltage of 200kV). In experiments, when a voltage of about 10V was applied to the electrodes, ADF-STEM images were obtained at highest resolution, and lattice fringes of a CeO2 crystal were clearly observed. These results demonstrate that our developed device achieves successfully correction of the spherical-aberration and improvement of the spatial resolution.