[15p-PB2-1~53] 8 Plasma Electronics（Poster)

[15p-PB2-15] Development of heat treatment technology for improvement of crystallinity of Ge/Si heterostructures

〇(M2)kazuki kamimura¹, Hiroki Nakaie¹, Tetsuji Arai¹, Keisuke Arimoto¹, Junji Yamanaka¹, Chiaya Yamamoto¹, Kiyokazu Nakagawa¹, Toshiyuki Takamatsu² (1.Univ. of Yamanashi, 2.SST Inc.)

Keywords:Ge/Si heterostructure,heat treatment,hydrogen radical